The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 18, 2003
Filed:
Sep. 12, 2000
Raymond E. Lindner, Corning, NY (US);
Mahendra Kumar Misra, Horseheads, NY (US);
David C. Sauer, Horseheads, NY (US);
Corning Incorporated, Corning, NY (US);
Abstract
Methods for producing high purity fused silica (HPFS) glass having desired levels of dissolved hydrogen are provided. The methods involve measuring the level of hydrogen in the cavity of the furnace used to produce the glass and controlling the pressure within the furnace and/or gas flows to the furnace's burners so that the measured concentration has a desired value. In this way, the level of dissolved hydrogen in the glass can be controlled since, as shown in FIG. there is a direct correlation between the hydrogen concentration in the cavity atmosphere and level of dissolved hydrogen in the glass.