The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 11, 2003

Filed:

Nov. 13, 2001
Applicant:
Inventors:

Dmitri Kovalevskii, Fort Collins, CO (US);

Michael Kishinevsky, Manalapay, NJ (US);

David J. Christie, Fort Collins, CO (US);

Assignee:

Advanced Energy Industries, Inc., Fort Collins, CO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H02M 7/122 ;
U.S. Cl.
CPC ...
H02M 7/122 ;
Abstract

There is provided by this invention an apparatus and method for generating voltage pulses to first and second magnetron devices in a plasma chamber. An isolation transformer is connected to a pulsed DC power supply having a flux sensor, such as a Hall effect sensor, in close proximity to its air gap to monitor the transformer flux. A control circuit is connected to the flux sensor to control the duty cycle of the transformer by controlling the flux of the transformer such that the maximum and minimum peak transformer fluxes are equal in magnitude and opposite in sign to prevent saturation.


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