The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2003
Filed:
Jul. 17, 2001
Vincent Detalle, Montreal, CA;
Mohamad Sabsabi, Boucherville, CA;
National Research Council of Canada, Ottawa, CA;
Abstract
In a method of spectrochemical depth-profile analysis of heterogeneous materials, a first burst of ablation laser pulses in a first beam is directed at a sample to form an ablation crater. A second single pulse or burst of laser pulses in a second beam having a smaller width than said first beam is then directed at the bottom of the crater so as to create a plasma that emits radiation representative of a component in the sample without a significant contribution from the walls of the ablation crater. The intensity of radiation from the plasma is measured and the concentration of the selected component is determined from the intensity of the radiation. The depth at which the measurement is taken is then evaluated and the above steps repeated to determined the evolution of concentration of said selected component as a function of depth.