The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2003
Filed:
Nov. 05, 1998
Yuichi Osakabe, Utsunomiya, JP;
Nobuhiro Kodachi, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An alignment system for aligning a reticle, having a pattern to be transferred and a mark for alignment, with a photosensitive substrate to which the pattern of the reticle is to be transferred by exposure. The alignment system includes a substrate stage being movable while holding the photosensitive substrate thereon, the substrate stage having at least one mark for relative position detection, and a light transmissive flat plate-like member separate from the reticle and disposed between positions of the reticle and the substrate when the reticle and the substrate are placed to be aligned with each other. The plate-like member has a mark for relative position detection with respect to the reticle and another mark for relative position detection with respect to the substrate stage, which marks are provided separately.