The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2003
Filed:
Feb. 12, 2001
Ali Tabatabaie-Raissi, Melbourne, FL (US);
Nazim Z. Muradov, Melbourne, FL (US);
Eric Martin, Indialantic, FL (US);
University of Central Florida, Orlando, FL (US);
Abstract
A new method for design and scale-up of photocatalytic and thermocatalytic processes is disclosed. The method is based on optimizing photoprocess energetics by decoupling of the process energy efficiency from the DRE for target contaminants. The technique is applicable to both low and high-flux photoreactor design and scale-up. The low-flux method is based on the implementation of natural biopolymeric and other low-pressure drop media support for titanium dioxide and other band-gap photocatalysts. The high-flux method is based on the implementation of multifunctional metal oxide aerogels and other media in conjunction with a novel rotating fluidized particle bed reactor.