The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 11, 2003
Filed:
Mar. 01, 2001
Applicant:
Inventors:
Andrew James Seeley, Bristol, GB;
James Robert Smith, Blackford, GB;
Assignee:
The BOC Group plc, Windlesham, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 4/700 ;
U.S. Cl.
CPC ...
B01D 4/700 ;
Abstract
A method for the abatement of one or more pyrophoric gases in a gas stream, which includes introducing water in to the gas stream and/or mixing the gas stream with preheated air and introducing the gas stream in to a container in which the pyrophoric gases are abated.
Seeley, Andrew. (2003). Abatement of semiconductor processing gases (U.S. Patent No. 6530977). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6530977
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile