The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2003
Filed:
Apr. 12, 2000
Wenhui Mei, Plano, TX (US);
Takashi Kanatake, Dallas, TX (US);
Ball Semiconductor, Inc., Allen, TX (US);
Abstract
Disclosed is a method, system, and lense system for performing lithography on a substrate. The system includes a unique lense system for nonplanar substrates. The lense system includes a first lense section for receiving a pattern and producing a concave image of the pattern. The concave image can the be received by a second lense section for producing a nonplanar image of the pattern. The system also includes two light sources and a digital imaging device for projecting and exposing the pattern through the lense section and onto the substrate. Light from the first light source is used for exposing the pattern while light from second light source is used for receiving an alignment image. An image sensor, using the light from the second light source, detects an alignment image from the substrate. The alignment image is used to accommodate the projection of the pattern onto the substrate so that the pattern is properly aligned to the substrate.