The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2003
Filed:
Mar. 31, 2000
Xiaohong Zhou, Houston, TX (US);
Joseph K. Maier, Milwaukee, WI (US);
Steven J. Huff, Hartland, WI (US);
GE Medical Systems Global Technology Co., LLC, Waukesha, WI (US);
Abstract
A method and apparatus for correcting ghosting artifacts that are related to Maxwell fields and/or other perturbation magnetic fields is disclosed. The method and apparatus includes acquiring MR image n-space data and an MR reference scan, each having perturbation field effects therein. After determining phase correction values from the MR reference scan and reconstructing an MR image using the phase correction values, a projection phase error is calculated from the reconstructed MR image and then subtracted from the reference scan, the result of which is used to determine a new set of phase correction values. The new set of phase correction values is applied to the acquired MR image data to reconstruct a new image. The reconstructed new image can then be reused to calculate a new projection phase error, which again is subtracted from the reference scan data and the process is repeated until an image of desired ghost artifact reduction is achieved.