The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2003
Filed:
Feb. 12, 2001
Applicant:
Inventor:
Wayne K. Shaffer, Penfield, NY (US);
Assignee:
Icon Laser Technologies, Inc., Rochester, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 2/600 ;
U.S. Cl.
CPC ...
B23K 2/600 ;
Abstract
An apparatus for forming transitioned edges in patterns formed by a scanning laser in a dyed textile material is disclosed. The transition rate between the untreated material and the treated material is controlled by passing a scanning laser beam through a mask prior to the laser beam reaching a focal point. An apertured mask can be employed to control the transition rate, wherein the location of the aperture relative to the focal point of the laser beam and configuration of the aperture periphery are manipulated to effect the transition rate.