The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2003
Filed:
Dec. 03, 1999
Applicant:
Inventors:
Howard E. Jackson, Cincinnati, OH (US);
Din Ping Tsai, Taichung, TW;
Assignee:
University of Cincinnati, Cincinnati, OH (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/141 ;
U.S. Cl.
CPC ...
G01N 2/141 ;
Abstract
A method and system for determining a spatially local index of refraction in optical materials is provided. Light, including a near-field intensity, is collected above a surface of the material. A probe is oscillated at a plurality of frequencies and in a substantially perpendicular manner relative to the surface of the material to detect the near-field intensity of the light. A distance of the probe from the surface of the material is modulated. Based on a ratio of the near-field intensity of the light detected at the plurality of frequencies, the local index of refraction is determined.