The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2003
Filed:
Apr. 25, 2000
Apparatus and method for production testing of the rf performance of wireless communications devices
Jacek J. Wojcik, Nepean, CA;
Aprel, Inc., Nepean, CA;
Abstract
A radio frequency (RF) multi-testing apparatus and method for rapid (e.g. production line) testing of a wireless communications device for operational adherence of the device to a pre-determined reference specification defining specific absorption rate (SAR) parameters correlated to the device and for simultaneous testing of the body loss of the device. The device is positioned within an RF shielded enclosure and operated at a test transmit power. A linear array of E-field isotropic probes (e.g. five) are positioned at a predetermined location in the container within human tissue simulation matter and measure the electric-field therein. A plurality of RF isotropic probes are spatially distributed within the container and measure the RF power received thereby, with the container providing reflective surfaces therein. Computer processing apparatus compares the electric-field measurements to the SAR reference specification and determines therefrom whether the device adheres to the specification. The computer processing apparatus also combines the RF power measurements and produces a value representing the averaged integrated body loss of the device. The determination of whether the device adheres to the SAR specification also determines a measure of the metallic system integrity of the device.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile