The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2003
Filed:
Dec. 17, 1999
Linus Albert Fetter, Morganville, NJ (US);
John Z. Pastalan, Hampton, NJ (US);
Agere Systems, Inc., Allentown, PA (US);
Abstract
The invention presents a deposition method which varies the growth conditions of a film on a patterned substrate. For example, deposition conditions required for obtaining growth are determined for each of the substrate's component surfaces. Film deposition begins under the conditions used to deposit material on one of the substrate materials. Then, the growth parameters are adjusted towards desired conditions for the other substrate material as another small amount of material is deposited. The adjustment and subsequent deposition is repeated until the desired conditions for growth on the second material are met. Growth of the remainder of the film then continues under the desired deposition conditions for growth on the second material.