The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2003
Filed:
Feb. 09, 2001
Yuanda Randy Cheng, San Jose, CA (US);
Connie Chunling Liu, San Jose, CA (US);
Chung Shih, Cupertino, CA (US);
Linda Lijun Zhong, Fremont, CA (US);
Jeff Duane St. John, Los Gatos, CA (US);
Jeffery Lee Petrehn, Fremont, CA (US);
Seagate Technology LLC, Scotts Valley, CA (US);
Abstract
High areal density magnetic recording media exhibiting low noise are formed with a Ni—P—X plating layer, in which X is an additive meeting the following requirement: (1) The additive has a higher oxidation potential than that of Ni so that grains of an additive-rich-oxide will form first during oxidation under a controlled atmosphere and grains of a Ni-rich-oxide, if any, will form subsequently and separately from the grains of the additive-rich oxide. (2) The additive has a tendency to segregate to the top surface. (3) The additive is not a catalyst poison for Ni—P plating in the composition range.