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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6522897 B1

PDFFull Text
Date of Patent:
Feb. 18, 2003

Filed:

Jul. 20, 1999

Rf radiation pattern synthesis using existing linear amplifiers

Applicant:
Inventors:

Gary Allen Martek, Edgewood, WA (US);

Martin J. Feuerstein, Redmond, WA (US);

Douglas O. Reudink, Kirkland, WA (US);

Assignee:

Metawave Communication Corporation, Redmond, WA (US);

Attorney:

Fulbright & Jaworski L.L.P.

Primary Examiner:

Vivian Chin

Assistant Examiner:

Duc Nguyen

Int. Cl.
CPC ...
H04M 1/00 ;
U.S. Cl.
CPC ...
H04M 1/00 ;
Abstract

There is disclosed an RF synthesis system for allowing a phase signal to be created from a plurality of antennas while using a single LPA for each panel of the array. Provision is made to control the power levels between the antennas of each panel by a series of phase adjustments used in conjunction with RF hybrid circuits. Provision is made for changing the sector alignment by using cross panels and also by rearranging the signals from the various RF inputs.

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Martek, Gary. (2003). Rf radiation pattern synthesis using existing linear amplifiers (U.S. Patent No. 6522897). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6522897

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