The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2003
Filed:
Aug. 17, 1999
Edward E. Ehrichs, Austin, TX (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method, system, and storage medium for determining retide tilt in a lithographic system is provided. Test patterns contained on a reticle are printed in a photoresist located on an upper surface of a semiconductor substrate by a lithographic system. The test patterns may include three posts of different diameters wherein one of the diameters is approximately equal to the minimum allowable feature size printable by the lithographic system. Images of the test patterns are measured by a scanning electron microscope under the control of a computer system. The computer system then assesses the measured images of the test patterns to determine if the reticle tilt is acceptable or unacceptable. In one embodiment, the computer system may assess the measured images by comparing the measured images to predetermined images of the test patterns for different focus conditions. The computer system may also calculate the amount of reticle tilt. In an alternative embodiment, the computer system may assess the measured images by comparing the measured images to each other.