The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2003

Filed:

Aug. 22, 1996
Applicant:
Inventors:

Munehiro Shibuya, Kyoto, JP;

Masatoshi Kitagawa, Osaka, JP;

Yuuji Mukai, Osaka, JP;

Akihisa Yoshida, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 3/100 ; H01L 2/930 ; H01L 3/106 ;
U.S. Cl.
CPC ...
H01L 3/100 ; H01L 2/930 ; H01L 3/106 ;
Abstract

A silicon structure having little solar light beam reflection, which is suitable for a solar battery. On the entire surface of a quartz substrate, Mo is deposited at a thickness of approximately 51 &mgr;m to form a lower electrode. On the entire surface of the lower electrode, a p type silicon structure having a thickness of 30 to 40 &mgr;m comprising an aggregate of a plurality of columnar silicon members mainly comprising silicon and having random orientations is formed via a film mainly comprising silicon, using Si Cl mixed with BCl . On the surface of the p type silicon structure, P is diffused by a thermal diffusion method using POCl to form an n type region at the periphery of the columnar silicon members. On the entire surface of the p type silicon structure, a transparent electrode comprising indium-tin oxide having a thickness of 30 to 40 &mgr;m is formed, and an upper electrode comprising Al having a thickness of approximately 1 &mgr;m is formed on the transparent electrode.


Find Patent Forward Citations

Loading…