The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2003
Filed:
Nov. 07, 2001
Min Gyu Lim, Chungcheongbuk-do, KR;
Dongbu Electronics, Co. Ltd., Seoul, KR;
Abstract
A method that includes: providing a substrate where a memory cell array region and a peripheral region are defined; forming a buried layer on the substrate; forming a gate material by positioning a gate insulating film on the substrate having the buried layer; forming first gates by covering the peripheral region, and etching the gate material of the memory cell array region according to a photolithography process; forming an insulating pattern on the substrate to fill up a space between the first gates and expose the surfaces of the first gates; forming second gates by covering the memory cell array region, and etching the gate material of the peripheral region according to the photolithography process; and forming a low resistance layer on the first gates, and simultaneously forming a source/drain at both sides of the second gates, by doping an impurity to the substrate having the first and second gates.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile