The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2003
Filed:
Mar. 28, 2001
Doug J. Resnick, Phoenix, AZ (US);
Kevin J. Nordquist, Higley, AZ (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
This invention relates to semiconductor devices, microelectronic devices, micro electro mechanical devices, microfluidic devices, and more particularly to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template ( ) is formed having a substrate ( ) and a template pedestal ( ) having formed thereon an uppermost surface an etched pattern or relief image ( ). The template ( ) is used in the fabrication of a semiconductor device ( ) for affecting a pattern in the device ( ) by positioning the template ( ) in close proximity to semiconductor device ( ) having a radiation sensitive material ( ) formed thereon and applying a pressure ( ) to cause the radiation sensitive material ( ) to flow into the relief image ( ) present on the template ( ). Radiation ( ) is then applied through the template ( ) so as to further cure portions of the radiation sensitive material ( ) and further define the pattern in the radiation sensitive material ( 0). The template ( ) is then removed to complete fabrication of semiconductor device ( ).