The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2003
Filed:
Sep. 26, 2000
Grating fabrication process using combined crystalline-dependent and crystalline-independent etching
Applicant:
Inventors:
Lilac Muller, Boulder, CO (US);
Kenneth Edmund Arnett, Boulder, CO (US);
Larry Fabiny, Boulder, CO (US);
Kristofer Stefan Josef Pister, Orinda, CA (US);
Assignee:
Network Photonics, Inc., Boulder, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/18 ; H01L 2/1306 ;
U.S. Cl.
CPC ...
G02B 5/18 ; H01L 2/1306 ;
Abstract
A diffraction grating is fabricated by forming two sets of parallel trenches in a crystal surface, one set with a crystalline-independent etching technique and the other made with a chemically crystalline-dependent etchant. The intersection of the two sets of trenches removes material from the crystal surface to produce an etched crystal surface that can be coated with a reflective material to form the diffraction grating or can be used as a master for batch fabrication of diffraction gratings.