The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2003
Filed:
Mar. 23, 2000
Applicant:
Inventors:
Akira Miyamae, Fujimi-machi, JP;
Hidemichi Furihata, Suwa, JP;
Hideaki Yamada, Shimo-suwa-machi, JP;
Assignee:
Seiko Epson Corporation, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 7/00 ;
U.S. Cl.
CPC ...
G11B 7/00 ;
Abstract
Provided is a processing method of a master optical disc with an improved jitter and modulating degree of the reproduced signal, and a fine reading accuracy. In an exposure step for forming one pit by laser beam exposure of a plurality of pulse arrays, using the laser beam for exposure to an optical disc as an intermittent beam, the pulse length of the edges of a pit is made longer than the pulse length of the center portion. Moreover, the pulse interval behind the front edge pulse and/or the pulse interval in front of the rear edge pulse is longer than the pulse interval of the center portion.