The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2003
Filed:
Jun. 06, 2001
James Jiahua Yu, Milpitas, CA (US);
Bhanwar Singh, Morgan Hill, CA (US);
Angela T. Hui, Fremont, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method of fabricating an integrated circuit can include providing a layer of silicon nitride over a semiconductor substrate where the layer of silicon nitride has a first thickness selected based on a desired size of extensions; providing a layer of photoresist material over the layer of silicon nitride; patterning the layer of photoresist to form photoresist features being separated at the top of the photoresist features by one minimum lithographic feature and etching a portion of the layer of silicon nitride to form a hole for an integrated circuit device feature. The photoresist features include extensions at the bottom of the photoresist features. The extensions define footings. These footings reduce the separation at the bottom of the photoresist features. As such, exposed portions of the layer of silicon nitride are less than one minimum lithographic feature in width.