The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2003
Filed:
Oct. 16, 2001
Samsung Electronics Co. Ltd., Suwon, KR;
Abstract
A chemical mechanical polishing slurry includes an additive of a quaternary ammonium compound having a form of {N—(R R R R )} X , in which R , R , R , and R are radicals, and X is an anion derivative including halogen elements. Preferably, the quaternary ammonium compound is one of [(CH ) NCH CH OH]Cl, [(CH ) NCH CH OH]l, [(CH ) NCH CH OH]Br, [(CH ) NCH CH OH]CO , and mixtures thereof. The slurry may further include a pH control agent formed of a base such as KOH, NH OH, and (CH ) NOH, and an acid such as HCl, H SO , H PO , and HNO . Also, the pH control agent can include [(CH ) NCH CH OH]OH. The slurry may further include a surfactant such as cetyldimethyl ammonium bromide, cetyldimethyl ammonium bromide, polyethylene oxide, polyethylene alcohol or polyethylene glycol.