The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 04, 2003
Filed:
Apr. 25, 2001
Applicant:
Inventors:
Subra Suresh, Wellesley, MA (US);
Tae-Soon Park, Cambridge, MA (US);
Assignee:
California Institute of Technology, Pasadena, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 3/00 ; G01N 2/516 ; G01B 1/124 ; G01B 2/120 ;
U.S. Cl.
CPC ...
G01N 3/00 ; G01N 2/516 ; G01B 1/124 ; G01B 2/120 ;
Abstract
Techniques for evaluating curvatures in line features embedded in a different material layer formed on a substrate. A model based a uniform layer formed over a substrate may be used to represent a structure with parallel line features embedded in a layer formed over the substrate. The curvatures of the uniform layer due to an elastic distortion along a first direction substantially parallel to the line features and along a second direction orthogonal to the first direction are determined. Next, the curvatures of the uniform layer may be used as respective curvatures of each of the line features.