The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2003
Filed:
Sep. 21, 2000
Sylvia D. Pas, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method for fabricating a phase shift photomask ( ) includes providing a photomask ( ) having a substantially opaque layer ( ) on a surface ( ) of a substantially transparent substrate ( ). The opaque layer ( ) includes a removed portion to define a light transmitting pattern ( ) of the photomask ( ). The method also includes depositing an implant ( ) in a portion of the substrate ( ). The implanted portion ( ) of the substrate ( ) includes an etch rate different than an etch rate of an unimplanted portion ( ) of the substrate ( ). The method includes initiating an etch of the substrate ( ) corresponding to the light transmitting pattern ( ) and monitoring a rate of the etch. The method further includes terminating the etch in response to detecting a change in the rate of the etch.