The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2003

Filed:

Oct. 22, 1999
Applicant:
Inventors:

Gerald P. Sitarski, Grand Island, NY (US);

Chinawut Paul Paesang, Hamburg, NY (US);

Assignee:

Mattel, Inc., El Segundo, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A47C 1/300 ;
U.S. Cl.
CPC ...
A47C 1/300 ;
Abstract

A child support device that can be converted between a highchair configuration and a swing configuration. The support device includes a frame from which a U-shaped swing arm is rotably mounted. A child seat is located on the U-shaped arm such that it can be slid between a distal position at the bottom of the U-shaped swing arm (swing configuration) and a proximal position at the upper ends of the U-shaped swing arm (highchair configuration). When in the highchair configuration, a swing lock can be provided to rotably lock the U-shaped swing arm with respect to the frame such that the seat cannot swing. The swing lock can include a retractable post that can be extended to contact a portion of the frame to prevent rotation of the swing arm. An over rotation stop can also be provided to limit the angle of rotation through which the seat swings when in the swing configuration, and to work in conjunction with the retractable post to lock the swing arm in place when in the highchair configuration. A reversible softgoods device is also disclosed to provide padding for the child support. The softgoods device includes a first layer and second fluid resistant layer that can be selectively exposed from the child support device.


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