The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2003
Filed:
Nov. 28, 2000
Applicant:
Inventors:
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G02B 5/00 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/754 ; G02B 5/00 ;
Abstract
An aperture stop that can be used in an exposure apparatus and method includes a central aperture region defined by a circular arc and a peripheral region having a decreased width.
Tanaka, Masashi. (2003). Aperture stop having central aperture region defined by a circular arc and peripheral region with decreased width, and exposure apparatus and method (U.S. Patent No. 6509954). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6509954
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile