The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2003
Filed:
Apr. 30, 2001
Applicant:
Inventor:
Bret L. Halpern, Bethany, CT (US);
Assignee:
Jet Process Corporation, New Haven, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 3/10 ;
U.S. Cl.
CPC ...
B05D 3/10 ;
Abstract
A method for forming metallic nanoclusters upon a substrate includes moving the substrate through a deposition chamber at a predetermined uniform velocity and depositing metallic precursor compounds onto the substrate. The metallic precursor compounds are subsequently bombarded with an ultrasonic jet of atomic hydrogen to form the metallic nanoclusters.
Halpern, Bret. (2003). Method and apparatus for the deposition of metal nanoclusters and films on a substrate (U.S. Patent No. 6509067). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6509067
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile