The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2003

Filed:

Nov. 21, 2000
Applicant:
Inventors:

Dong-jin Park, Kyungki-do, KR;

June-ing Gil, Kyungki-do, KR;

Je-eung Park, Kyungki-do, KR;

Sang-mun Chon, Kyungki-do, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/04 ; C11D 3/30 ; C11D 9/30 ;
U.S. Cl.
CPC ...
B08B 3/04 ; C11D 3/30 ; C11D 9/30 ;
Abstract

A resist removing composition has an excellent capability for removing a resist, polymer, organometallic polymer and metal oxide and which does not attack underlying layers, and a resist removing method using the same. The resist removing composition includes alkoxy N-hydroxyalkyl alkanamide, at least one selected from the group consisting of alkanolamine, a polar material having a dipole moment of 3 or greater and an attack inhibitor, and hydrogen peroxide or at least one of a fluoride-based reducing agent and a hydroxide-based reducing agent.


Find Patent Forward Citations

Park, Dong-jin. (2003). Resist removing composition and resist removing method using the same (U.S. Patent No. 6508887). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6508887

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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