The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2003
Filed:
Feb. 10, 2000
Applicant:
Inventor:
Christian W. Lehmann, Mülheim an der Ruhr, DE;
Assignee:
Studiengesellschaft Kohle mbH, Mulhiem an der Ruhr, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/320 ;
U.S. Cl.
CPC ...
G01N 2/320 ;
Abstract
Method and device for rapid characterization of arrays of crystalline, polycrystalline or amorphous materials; in particular for the formation and X-ray diffraction analysis of polymorph libraries and the discovery of new crystal forms. According to one aspect, a multi-well plate comprising a masking plate with an array of openings and a removable base plate is used to crystallize precipitates. X-ray diffraction analysis is performed by scanning an X-ray beam over the base plate and recording diffractograms of the crystalline precipitates.