The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2003

Filed:

Mar. 21, 2000
Applicant:
Inventors:

Emmanuel Picard, St Martin d'Vriage, FR;

Noël Magnea, Muirmus, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 1/749 ; H01J 6/120 ;
U.S. Cl.
CPC ...
H01J 1/749 ; H01J 6/120 ;
Abstract

The invention relates to a plasma cell able to be fixed in a vacuum chamber by means of a first flange, having an outer envelope in which a gas under pressure (P′) is added and provided in its upper part with a discharge opening, and electrodes, at least one anode and one cathode, arranged in said envelope and mounted on a second flange, to whose terminals a voltage may be applied, such as to cause ionization of the gas producing the monoatomic species which are to be discharged through the opening. Electrodes can be dismounted and are assembled on a second removable flange. Electrically insulated separation means are provided between cathode and anode(s). A gas inlet opening is provided in the lower part of the envelope.


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