The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2003
Filed:
Nov. 27, 2000
Bruce R. Scharf, Seattle, WA (US);
Joel A. Kubby, Rochester, NY (US);
Chuang-Chia Lin, San Pablo, CA (US);
Alex T. Tran, Ithaca, NY (US);
Andrew J. Zosel, Covington, WA (US);
Peter M. Gulvin, Webster, NY (US);
Jingkuang Chen, Rochester, NY (US);
Other;
Abstract
The present invention provides a micromechanical or microoptomechanical structure produced by a process comprising defining the structure in a single-crystal silicon layer separated by an insulator layer from a substrate layer; selectively etching the single crystal silicon layer; depositing and etching a polysilicon layer on the insulator layer, with remaining polysilicon forming mechanical elements of the structure; metalizing a backside of the structure; and releasing the formed structure.