The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2003

Filed:

Apr. 25, 2001
Applicant:
Inventor:

Mark C. Dietrich, Tucson, AZ (US);

Assignee:

Raytheon Company, Lexington, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F42B 1/236 ;
U.S. Cl.
CPC ...
F42B 1/236 ;
Abstract

A method an apparatus for inducing spin, or rotation, in a dispersed payload of a non-spin guided projectile is taught. Rifling is applied to a cylindrical surface of a projectile casing. The rifling engages a member on a payload, which may be a bulkhead, as the payload is expelled from the projectile casing. The rotation imparted to the payload causes the dispersed projectile, grenades in the preferred embodiment, to form a spiral pattern that provides a more uniform coverage of the target area as compared to the prior art.


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