The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2003
Filed:
Aug. 13, 2001
Applicant:
Inventors:
Atsuko Okawa, Yokohama, JP;
Yasuo Hira, Yokohama, JP;
Hirotaka Imayama, Kawasaki, JP;
Masayasu Fujisawa, Kanagawa, JP;
Saburou Suzuki, Minamiashigara, JP;
Eisei Togawa, Odawara, JP;
Noriyuki Saiki, Odawara, JP;
Nobuo Suzuki, Fujisawa, JP;
Hiroshi Agari, Odawara, JP;
Kiyoshi Akamatsu, Yokohama, JP;
Hiromu Chiba, Yokohama, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/60 ;
U.S. Cl.
CPC ...
G11B 5/60 ;
Abstract
A method of manufacturing a magnetic head slider for a magnetic head and the magnetic slider wherein the slider has non-linear rails formed in a floating surface thereof by processing including one of reactive ion etching, sputter etching and an ion milling, and side walls of the non-linear rails are polished after formation of the non-linear rails by the processing.