The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2003
Filed:
Jul. 20, 2001
Yukihiro Nagai, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of manufacturing semiconductor device is provided which can minimize the thinning of a nitride layer in the planarization process and inhibit the peripheral area of the nitride layer from being excessively polished. The method of manufacturing semiconductor device includes the steps of: forming a nitride layer on a semiconductor substrate; patterning the nitride layer and etching the semiconductor substrate while masking with a pattern of the nitride layer to form a trench; depositing an oxide layer to fill the trench and cover the nitride layer; patterning a resist layer on the oxide layer; etching the oxide layer on the nitride layer; and planarizing the oxide layer, wherein the step of etching the oxide layer permits a thickness of the oxide layer to be left on the nitride layer.