The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2003
Filed:
Nov. 02, 1999
Yasuo Murakami, Mukô, JP;
Takahiro Nakahigashi, Kyoto, JP;
Nissin Electric Co., Ltd., Kyoto, JP;
Abstract
The invention provides a plasma CVD method and device which can form a uniform or substantially uniform film on an outer surface of an object independently of the shape of the object, and also provides an electrode used in the method and device. More specifically, a plasma is formed from a deposition material gas by supplying an electric power to the gas, and a film is formed on the outer surface of a hollow object having an opening under the plasma. The electrodes for supplying the electric power for forming the gas plasma include an internal electrode arranged in an inner space of the hollow object and an external electrode arranged outside the object. The internal electrode can selectively have a reduced form allowing passage of the electrode through the opening of the hollow object and an enlarged form predetermined in accordance with the volume and shape of the inner space of the object.