The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2002

Filed:

Oct. 22, 1999
Applicant:
Inventor:

Kuo-Young Cheng, Taichung Hsien, TW;

Assignee:

DynaLab Inc., Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 1/100 ;
U.S. Cl.
CPC ...
G06T 1/100 ;
Abstract

A system, method, and computer-readable medium for generating a glyph-based outline font are provided, which allow for font communication between different devices having various (high and low) resolutions. A method selects a character for display on the output device. The character consists of one or more glyphs, and each glyph forming the character is predefined by key points, width values, feature points that have predefined spatial relationship to the key points and width values, and curve ratios prestored in a curve level table. Next, the method determines the resolution of an output device. Then, for each glyph forming the character, the method retrieves curve ratios from the prestored curve level table according to the determined resolution of the output device. Curve ratios are used to create curve segments, which form the outline of the selected glyph. Finally, the method renders the glyphs of the selected character on the output device according to the key points, the width values, the feature points, and the retrieved curve ratios.


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