The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 31, 2002
Filed:
Jun. 17, 1998
Applicant:
Inventors:
Assignee:
Magnetic Resonance Innovations, Inc., St. Louis, MO (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01V 3/00 ;
U.S. Cl.
CPC ...
G01V 3/00 ;
Abstract
The echo time in an MR pulse sequence is optimized in accordance with the application desired. Advantageously, the echo time is selected to cause a partial volume signal cancellation from veins as compared with background tissue, and the MR pulse sequence is of a velocity-compensated type. MR data are acquired from gradient echoes. Multiple echoes may be used to extract information (such as volume content and susceptibility) about the material under investigation.
Quick Actions:
Haacke, E.. (2002). Application-specific optimization of echo time in mr pulse sequences for investigating materials with susceptibilities different from that of the background in which they are embedded (U.S. Patent No. 6501272). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6501272
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile