Method for manufacturing tft-integrated color filter using photocatalysis, color filter, and liquid crystal display

Abstract

A method for manufacturing a TFT-integrated color filter is provided, which can controllably fabricate a color filter having a high aperture efficiency and a high resolution at low costs without the need for aligning the color filter with a TFT substrate as required by the prior art. The method for manufacturing a thin-film transistor integrated color filter includes the steps of: preparing a color filter fabrication substrate by forming thin-film transistors and light-transmissive pixel electrodes in arrays on a light-transmissive substrate and providing a photocatalytic thin film in contact with the pixel electrodes so that portions of the pixel electrodes are exposed; preparing an electrolytic solution containing a coloring material and another material which may decrease in solubility or dispersibility with respect to an aqueous solution with any change in pH; placing the color filter fabrication substrate in the electrolytic solution so that at least the pixel electrodes and the photocatalytic thin film are in contact with the electrolytic solution; and with predetermined ones of the thin-film transistors driven selectively, illuminating the color filter fabrication substrate with ultraviolet light to form a colored film on the surface of the photocatalytic thin film corresponding to the undriven thin-film transistors.