The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2002
Filed:
Dec. 21, 2000
Kuen Lee, Hsinchu, TW;
Chao-Hsu Tsai, Hsinchu, TW;
Industrial Technology Research Institute, Hsinchu, TW;
Abstract
A micro-retarder plate using a single plate with phase retardation. The plate with phase retardation having a pattern that further comprises a plurality of first retardation state areas and second retardation state areas alternating with each other is formed on the micro-retarder plate. The pattern is formed using an infra-red laser to expose the plate with phase retardation, or using a circuit board with a pattern of electrothermal resistor thereon in contact with the plate of phase retardation. The linear polarized lights with direction of polarization being 45 degrees to the stretching direction of the retardation film passing through the first retardation state areas and the second retardation state areas are perpendicular to each other. The micro-retarder is laminated between two protection layers with index matching glue to remove the scattering effect caused by the heat process.