The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2002
Filed:
Aug. 21, 2000
Jaeyeon Kim, Veradale, WA (US);
Honeywell International Inc., Morristown, NJ (US);
Abstract
The invention encompasses a method of forming a sputtering target. A wear profile for a sputtering target surface is determined. The wear profile corresponds to a shape of the used target surface after the target is subjected to the wear of having material sputtered therefrom. The wear profile is divided amongst a plurality of datapoints across the target surface. A difference in height of the target surface after the wear relative to a height of the target surface prior to the wear is calculated. The difference in height calculations generate a plurality of wear definition datapoints. Target lifetime datapoints are calculated using the wear definition datapoints, and sputtering uniformity datapoints are also calculated using the wear definition datapoints. A difference between the target lifetime datapoints and sputtering uniformity datapoints is calculated. A constant corresponding to the difference between a target lifetime datapoint and a sputtering uniformity datapoint is added to the sputtering uniformity datapoints to generate a desired profile for a sputtering target sputtering surface. A sputtering target is formed having a sputtering surface with the desired profile.