The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2002

Filed:

Dec. 23, 1999
Applicant:
Inventor:

Roy Winston Pascal, Union City, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 ;
U.S. Cl.
CPC ...
B08B 3/02 ;
Abstract

A spindle includes a hollow central shaft having an upper end and a lower end. The hollow central shaft defines a channel for transmitting fluid through the spindle. A wafer backing plate is disposed at the upper end of the hollow central shaft. The wafer backing plate reduces particle recontamination on the backside of a semiconductor wafer disposed above the spindle by preventing particles from contacting the backside of the wafer during spin processing. A spin, rinse, and dry module includes a bowl and a hollow core spindle for rotating a wafer that extends into the bowl. The hollow core spindle has a channel defined therein for transmitting a fluid to the backside of the wafer and a wafer backing plate disposed at an upper end thereof for preventing particles from contacting the backside of the wafer during spin processing.


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