The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 24, 2002

Filed:

Sep. 19, 2000
Applicant:
Inventor:

Paul M. Schermerhorn, Painted Post, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C03B 1/906 ;
U.S. Cl.
CPC ...
C03B 1/906 ;
Abstract

In furnaces for producing high purity fused silica glass boules, the refractory in the area of the burner holes reaches such elevated temperatures that cause impurities to leach out and the dissociation of the refractory, causing contamination of the silica glass. In order to reduce the temperature of the burner hole refractory, a porous insert or liner is positioned within the burner hole and a suitable gas is supplied thereto. The gas diffuses through the porous liner and not only cools the liner and refractory, but also forms a boundary layer along an inside surface of the insert that prevents particle buildup. The cooling of the insert and surrounding burner hole refractory prevents contamination of the silica glass from the refractory.


Find Patent Forward Citations

Schermerhorn, Paul. (2002). Method and apparatus for reducing refractory contamination in fused silica processes (U.S. Patent No. 6497118). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6497118

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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