The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2002

Filed:

Dec. 14, 1999
Applicant:
Inventor:

Guy Debras, Frasnes-lez-Gosselies, BE;

Assignee:

Fina Research, S.A., Feluy, BE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B 3/312 ;
U.S. Cl.
CPC ...
C01B 3/312 ;
Abstract

A process for producing ultra fine silica particles, the process comprising directing a plasma jet onto a silicon-containing compound thereby to form silica vapor and condensing the silica vapor on a collection surface.


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