The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2002
Filed:
Jan. 14, 2000
Mary T. Child, LaGrange, GA (US);
Frank W. Teaster, LaGrange, GA (US);
Ronald Magee, LaGrange, GA (US);
Milliken & Company, Spartanburg, SC (US);
Abstract
The present invention provides a sculptured pile fabric having both a printed pattern and a sculpted surface of various pile heights. The fabric of the present invention has improved aesthetic qualities as compared with sculptured products of the prior art. This improved sculptured fabric is the result of a chemical sculpting method, in which the height of the pile surface is selectively reduced in a pattern configuration, and that is followed by an overall “dilute” dyeing process. This “dilute” dyeing process is similar to that used to “tea stain” textile products, wherein an overall hue is imparted to a textile by the use of a relatively dilute (low concentration) dyestuff. The resulting sculptured product has an appearance that emphasizes the sculptured areas, making the sculptured areas appear to have greater depth, especially when viewed at a distance.