The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2002
Filed:
Sep. 19, 2001
Applicant:
Inventors:
Alain Bruyere, Villefontaine, FR;
Christian Debaille, Sathonay Village, FR;
Franck Perret, Lyons, FR;
Assignee:
Hexcel Fabrics (societe anonyme), Villeurbanne, FR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 3/08 ;
U.S. Cl.
CPC ...
B32B 3/08 ;
Abstract
A bias fabric is provided in that it is in the form of a cloth of length (L) and of finite width (l), being constructed by interlaced yarns ( ) extending in respective directions (D and d) that are oblique relative to the length (L), and each of which presents no knotting. The invention is applicable to engineering fabrics based on flat yarns.