The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2002

Filed:

Jul. 02, 1999
Applicant:
Inventors:

Masahiko Sato, Atsugi, JP;

Toshimitsu Konuma, Atsugi, JP;

Masakazu Odaka, Kisakata-machi, JP;

Toshiharu Yamaguchi, Zama, JP;

Toshio Watanabe, Atsugi, JP;

Osamu Aoyagi, Atsugi, JP;

Kaoru Tabata, Atsugi, JP;

Chizuru Isigaki, Atsugi, JP;

Hiroyuki Sakayori, Machida, JP;

Ippei Kobayashi, Atsugi, JP;

Akio Osabe, Atsugi, JP;

Shunpei Yamazaki, Tokyo, JP;

Toru Takayama, Atsugi, JP;

Akira Mase, Atsugi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1339 ;
U.S. Cl.
CPC ...
G02F 1/1339 ;
Abstract

An improved liquid crystal device and manufacturing method for same are described. In the device, a pair of substrates, between which a liquid crystal layer is disposed, is joined with pillars inbetween functioning as spacers which are provided of photocurable resin by photolithography. With this structure, the spacers can be in surface contact with the inside surfaces of the substrates on which electrode arrangement and active devices are formed.


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