The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6492621 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 10, 2002

Filed:

Aug. 21, 2001
Applicant:
Inventors:

Christopher Ratliff, Dana Point, CA (US);

Taiqing Qiu, Newton, MA (US);

Jeff Kowalski, Dove Canyon, CA (US);

Morteza Yadollahi, Irvine, CA (US);

Saeed Sedehi, Orange, CA (US);

Assignee:

ASML US, Inc., Scotts Valley, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F27B 5/14 ;
U.S. Cl.
CPC ...
F27B 5/14 ;
Abstract

An apparatus for heat treatment of a wafer is disclosed. The apparatus includes a heating chamber having a heat source. A cooling chamber is positioned adjacent to the heating chamber and includes a cooling source. A wafer holder is configured to move between the cooling chamber and the heating chamber through a passageway and one or more shutters defines the size of the passageway. The one or more shutters are movable between an open position where the wafer holder can pass through the passageway and an obstructing position which defines a passageway which is smaller than the passageway defined when the shutter is in the open position.


Find Patent Forward Citations

Ratliff, Christopher. (2002). Hot wall rapid thermal processor (U.S. Patent No. 6492621). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6492621

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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