The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Dec. 22, 2000
Applicant:
Inventors:
Hideo Shinomiya, Yokohama, JP;
Shoji Seta, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1302 ; H01L 2/13065 ;
U.S. Cl.
CPC ...
H01L 2/1302 ; H01L 2/13065 ;
Abstract
A second resist film is formed on a first resist film and then patterned. Thereafter, an SOG film is formed on the entire surface of the resultant structure to cover the second resist film. Subsequently, the SOG film and the second resist film and the first resist film are removed to pattern the SOG film and the first resist film. After that, using the patterned the first resist film as a mask, a trench is formed.