The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2002

Filed:

Apr. 17, 2001
Applicant:
Inventor:

Arnaud Muller-Feuga, Nantes, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 1/300 ; C12N 1/12 ; C12M 1/00 ; C12M 3/00 ;
U.S. Cl.
CPC ...
C12N 1/300 ; C12N 1/12 ; C12M 1/00 ; C12M 3/00 ;
Abstract

The invention relates to a method of improving the yield of a photobioreactor of the continuously operating recirculation type as a function of the species of micro-organism being cultured, of the thickness d of the chambers ( ) of the reactor, and of the final concentration desired for the culture. In the method, transparent or respecting particles ( ) are introduced into the reaction medium ( ), which particles are of a density that is substantially equal to that of the reaction medium, thereby adjusting absorbance of the microorganism culture to optimum levels. The invention is mainly applicable to culturing phototropic micro-organisms.


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