The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
May. 03, 2001
Applicant:
Inventor:
Yasuhisa Yamada, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
An electron beam drawing mask comprises a substrate for damping an electron beam to a predetermined quantity of electrons while the electron beam passes through the substrate, a metallic film formed on at least one surface of the substrate for interrupting the electron beam, a main pattern constituted by openings bored through the substrate and the metallic film, and an auxiliary pattern formed near the main pattern and constituted by window portions where the metallic film has been removed to expose the substrate.